Key takeaways
- Mobility depends on the surroundings more than on graphene. Devices on SiO2 usually sit near 10,000 cm²/Vs, suspended sheets passed 200,000 at 5 K, and graphene in boron nitride reached 140,000 at room temperature.
- Gated graphene in boron nitride has shown a sheet resistance below about 40 ohms per square at room temperature. Large-area CVD monolayer films sit near 125 ohms per square.
- Carriers move at about 106 m/s and there is no band gap. Conductivity bottoms out near 4e²/h instead of zero, which kept transistor on/off ratios near 100 in 2007 reports.
- Graphene carried a few times 108 A/cm² in a 2007 measurement, several orders of magnitude above present-day interconnects.
- Gaps can be opened, but small ones. About 200 meV in biased bilayers and in 15 nm ribbons, and roughly 16 to 28 meV on aligned boron nitride. Silicon has 1.12 eV.
What are the electrical properties of graphene, in numbers? Carriers move at about 106 m/s and the band gap is zero. Room-temperature mobility runs from about 10,000 cm²/Vs on a common SiO2 chip to 140,000 cm²/Vs in boron nitride, and sheet resistance can fall below 40 ohms per square. Each figure below carries the substrate, temperature and carrier density it was measured at, because a mobility without them means little.
Mobility is the drift speed a carrier gains per unit of electric field. Sheet resistance is the resistance of a square of film, whatever its size. For carrier density n, mobility μ and electron charge e it equals 1/(n e μ). Our graphene versus silicon comparison covers the wider contest. This page is the reference table behind it.
Graphene electrical properties: the measured values
Read the conditions column before the number. A mobility of 200,000 cm²/Vs at 5 K in vacuum is a different claim from 100,000 at room temperature in a sealed stack. Temperatures are as the papers state them. The abbreviation hBN means hexagonal boron nitride.
| Property | Value | Conditions | Source |
|---|---|---|---|
| Mobility, usual device on SiO2 | about 10,000 cm²/Vs | Exfoliated graphene on an oxidised silicon wafer, as summarised by Mayorov | Mayorov 2011 |
| Mobility, unsuspended devices, range | 2,000 to 25,000 cm²/Vs | Literature range quoted by Bolotin; the 25,000 value is at n = 5×1012 cm-2 | Bolotin 2008 |
| Mobility, SiO2 limit near room temperature | about 40,000 cm²/Vs | Ceiling from SiO2 surface phonons alone, measured in ultra-high vacuum | Chen 2008 |
| Mobility, intrinsic phonon limit near room temperature | about 200,000 cm²/Vs | Acoustic phonons in graphene itself, at n = 1012 cm-2 | Chen 2008 |
| Mobility, graphene on hBN, cold | Coulomb-scattering term 60,000 cm²/Vs; Hall mobility 25,000 at high density | Monolayer on hBN, fits at low temperature; the Coulomb term is about 3 times the value from a similar fit on SiO2 | Dean 2010 |
| Mobility, same flake on hBN and on SiO2 | about 20,000 against 2,000 cm²/Vs | Two regions of one flake, about 4 K | Dean 2010 |
| Mobility, suspended, cold | above 200,000 cm²/Vs (peak 230,000) | Suspended 150 nm, current annealed, n = 2×1011 cm-2, base temperature 5 K | Bolotin 2008 |
| Mobility, suspended, near room temperature | about 120,000 cm²/Vs | 240 K, n = 2×1011 cm-2 | Bolotin 2008, temperature study |
| Mobility, graphene between two hBN crystals | about 100,000 cm²/Vs at 300 K; about 140,000 at 4 K | Low density, about 1011 cm-2, hole side | Mayorov 2011 |
| Mobility, edge-contacted hBN stack | above 140,000 cm²/Vs at room temperature | Large-area stack; about 40,000 at the high density that gives the sheet resistance below | Wang 2013 |
| Mobility, large CVD film device | 7,350 cm²/Vs (Hall) | Monolayer Hall bar made from CVD film on copper, measured at about 6 K | Bae 2010 |
| Sheet resistance, gated hBN stack | below about 40 ohms per square | Room temperature, n = 4.5×1012 cm-2 set by a gate, not by doping | Wang 2013 |
| Sheet resistance, phonon limit | about 30 ohms per square | Room temperature; the paper finds it independent of carrier density | Chen 2008 |
| Sheet resistance, CVD monolayer film | about 125 ohms per square at about 97% transmittance | Large-area film grown on copper, transferred with a PMMA polymer support | Bae 2010 |
| Fermi velocity | about 106 m/s | Roughly 1/300 of the speed of light | Castro Neto 2009 |
| Minimum conductivity | near 4e²/h in experiments | Values cluster there in nearly 50 devices; most theories give 4e²/(πh) | Geim and Novoselov 2007 |
| Current density | a few ×108 A/cm² | 4 µm wide sheet taken as 0.35 nm thick, 76 K, helium atmosphere | Moser 2007 |
Why the mobility numbers span a factor of 100
Graphene has little intrinsic scattering, so its surroundings set the mobility. On SiO2, charged impurities and substrate phonons dominate. Chen and colleagues found that SiO2 surface phonons alone cap the mobility near 40,000 cm²/Vs. Real devices sit well below that.
Removing the substrate helped. In Bolotin’s sample 1 the carriers travel a mean free path of about 1.2 µm at n = 2×1011 cm-2. A second suspended study held 120,000 cm²/Vs at 240 K. Its authors noted that this beats the best room-temperature semiconductor they cited, InSb at 77,000.
Suspension is fragile, so the practical route is hBN. Dean measured about 20,000 cm²/Vs on hBN and 2,000 on SiO2 in the same flake. Mayorov then sealed graphene between two hBN crystals and saw about 100,000 at room temperature, with ballistic transport over about 1 µm. Wang added edge contacts and reached 140,000.
One caution applies. These record mobilities are read at low density, near 1011 cm-2 in the encapsulated case. Wang’s figure at the high density that gives 40 ohms per square is about 40,000. Quote a mobility without its density and you have quoted the best case.
Sheet resistance and the minimum conductivity
Take n = 1012 cm-2. At 10,000 cm²/Vs the formula gives about 620 ohms per square. At 200,000 it gives about 31 ohms, which matches the phonon limit Chen reports. These are our calculations from the stated inputs.
Wang’s gated stack stayed below about 40 ohms per square. Multiply by 0.35 nm, the thickness Moser used, and the equivalent bulk resistivity is about 14 nΩm. Copper is 16.78 nΩm at 20 °C. Wang states that the stack beats every metal at room temperature. The comparison needs care, because the stack holds 4.5×1012 cm-2 carriers only under gate bias.
Large films tell a more modest story. Bae reported a monolayer at about 125 ohms per square with about 97% transmittance, against about 350 for the best earlier single-layer value they cite. A four-layer film doped with nitric acid reached about 30 ohms per square at about 90% transparency. They set that film against indium tin oxide at under 100 ohms per square.
At the other end, conductivity does not vanish when the carrier density does. Geim and Novoselov show values clustering near 4e²/h across nearly 50 devices. That corresponds to about 6.45 kilohms per square by our arithmetic. The theoretical 4e²/(πh) would be about 20.3 kilohms. The disagreement has become known as the “mystery of a missing pie”, and their review leaves its cause open.
Dirac cone and Fermi velocity
Near the K points of the lattice, graphene’s energy rises linearly with momentum. The two bands form a cone with its tip at zero energy. Carriers behave like massless particles with an effective speed of light of about 106 m/s. Castro Neto and colleagues put it near 1/300 of the real speed of light.
Chen explains a consequence. Because of the linear dispersion, resistivity from isotropic scatterers such as acoustic phonons does not depend on carrier density. That is why the phonon limit in the table above is a single number.
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Why graphene has no off state, and how gaps are opened
A transistor channel must switch to near zero current. Graphene has no gap, so it keeps conducting at the neutrality point. Geim and Novoselov note on/off ratios of only about 100 and call the metallic neutrality point a major problem for mainstream logic.
Three routes open a gap. None reaches the 1.12 eV of silicon.
| Route | Gap | Conditions | Source |
|---|---|---|---|
| Bilayer plus perpendicular field | approaching 200 meV | Electrolyte top gate, n about 1.5×1013 cm-2, infrared spectroscopy | Mak 2009 |
| Bilayer plus field, expected range | up to 0.3 eV | With SiO2 as the dielectric | Geim and Novoselov 2007 |
| Nanoribbons | about 200 meV | Ribbons about 15 nm wide, measured at low temperature; the gap grows as width shrinks | Han 2007 |
| Monolayer aligned with hBN | about 16 to 28 meV | Thermal activation gaps of 190 to 320 K across four devices; the conversion to meV is ours | Hunt 2013 |
| Silicon, for scale | 1.12 eV | At 300 K | Wikipedia, Silicon |
Every route trades something. A biased bilayer needs a strong field. A ribbon needs edges cut to about 10 nm, which is the width Geim and Novoselov say room-temperature operation requires. Aligned boron nitride gives a gap near thermal energy, which is about 25.9 meV at 300 K by our calculation.
Graphene against silicon, GaAs and copper
These comparisons mix devices and conditions, so use them for orientation only. The silicon and GaAs values come from a general reference. The two band gaps and the GaAs mobility are listed at 300 K. The silicon mobility has no stated temperature or doping.
| Property | Graphene | Silicon | GaAs | Copper |
|---|---|---|---|---|
| Band gap | 0 | 1.12 eV | 1.424 eV | none (metal) |
| Electron mobility, cm²/Vs | about 10,000 on SiO2; above 140,000 in hBN at 300 K | about 1,400 | about 9,000 | not used |
| Resistivity at 20 °C | about 14 nΩm (gated hBN stack, our estimate) | not compared | not compared | 16.78 nΩm |
| Can switch off | No, on/off about 100 | Yes | Yes | No |
Silicon and GaAs mobilities are from Wikipedia’s electron mobility page and its GaAs page. Band gaps are from the silicon and GaAs pages. All are secondary sources. For another device built on silicon charge transport, see our CCD article.
What these numbers do not tell you
Record values come from small flakes made in research labs. Wafer-scale CVD material sits far lower, as the 7,350 cm²/Vs Hall mobility Bae measured at about 6 K shows. Temperatures and densities differ between rows, so no two rows are a like-for-like comparison.
The sources here date from 2007 to 2013. We did not review later work on gaps, so the gap table may understate what newer devices achieve.
Sources
- Geim and Novoselov, The rise of graphene, Nature Materials 6, 183 (2007)
- Castro Neto et al., The electronic properties of graphene, Reviews of Modern Physics 81, 109 (2009)
- Bolotin et al., Ultrahigh electron mobility in suspended graphene, Solid State Communications 146, 351 (2008)
- Bolotin et al., Temperature dependent transport in suspended graphene (2008)
- Chen et al., Intrinsic and extrinsic performance limits of graphene devices on SiO2, Nature Nanotechnology 3, 206 (2008)
- Dean et al., Boron nitride substrates for high-quality graphene electronics, Nature Nanotechnology 5, 722 (2010)
- Mayorov et al., Micrometer-scale ballistic transport in encapsulated graphene at room temperature, Nano Letters 11, 2396 (2011)
- Wang et al., One-dimensional electrical contact to a two-dimensional material, Science 342, 614 (2013)
- Moser, Barreiro and Bachtold, Current-induced cleaning of graphene, Applied Physics Letters 91, 163513 (2007)
- Bae et al., 30 inch roll-based production of high-quality graphene films for flexible transparent electrodes (preprint of the 2010 Nature Nanotechnology paper)
- Mak et al., Observation of an electric-field induced band gap in bilayer graphene by infrared spectroscopy (2009)
- Han et al., Energy band-gap engineering of graphene nanoribbons, Physical Review Letters 98, 206805 (2007)
- Hunt et al., Massive Dirac fermions and Hofstadter butterfly in a van der Waals heterostructure, Science (2013)
- Wikipedia, Electron mobility (silicon and GaAs values, secondary source)
- Wikipedia, Gallium arsenide (band gap and electron mobility, secondary source)
- Wikipedia, Silicon (band gap, secondary source)
- Wikipedia, Copper (resistivity at 20 °C, secondary source)
Cite this article
Turner, A. (2026, November 9). Graphene Electrical Properties: Measured Values and Conditions. ScienceShot. https://scienceshot.com/post/graphene-electrical-properties
Turner, Alex. “Graphene Electrical Properties: Measured Values and Conditions.” ScienceShot, 9 Nov. 2026, scienceshot.com/post/graphene-electrical-properties.
Turner, Alex. “Graphene Electrical Properties: Measured Values and Conditions.” ScienceShot, November 9, 2026. https://scienceshot.com/post/graphene-electrical-properties.
@online{scienceshot-graphene-electrical-properties-2026,
author = {Turner, Alex},
title = {{Graphene Electrical Properties: Measured Values and Conditions}},
organization = {ScienceShot},
date = {2026-11-09},
year = {2026},
url = {https://scienceshot.com/post/graphene-electrical-properties}
}https://scienceshot.com/post/graphene-electrical-properties
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